“Parallel: Erwin Olaf” presents nearly fifty photographs from the dynamic career of renowned Dutch photographer Erwin Olaf, covering the recent 15 years of his creative work. Olaf’s expertise lies in fashion photography and in creating provocative advertising campaigns. On this occasion, however, “Parallel” eschews Olaf’s most widely recognized images in favor of exploring a more personal side of the photographer’s work as he marks his own special career milestone. The works also weave together parallel elements that are on the one hand autobiographical, and on the other, dedicated to entirely constructed mis-en-scène. A number of the works will be shown in China for the first time. Entry fee is 40rmb.